Back أكسدة حرارية Arabic Термично окисление Bulgarian Oxidació tèrmica Catalan Thermische Oxidation von Silizium German Oxidación en semiconductores Spanish اکسایش حرارتی Persian Oxydation thermique French Oksidasi termal (fabrikasi mikro) ID 熱酸化 Japanese Термическое оксидирование Russian
In microfabrication, thermal oxidation is a way to produce a thin layer of oxide (usually silicon dioxide) on the surface of a wafer. The technique forces an oxidizing agent to diffuse into the wafer at high temperature and react with it. The rate of oxide growth is often predicted by the Deal–Grove model.[1] Thermal oxidation may be applied to different materials, but most commonly involves the oxidation of silicon substrates to produce silicon dioxide.
- ^ Liu, M.; et al. (2016). "Two-dimensional modeling of the self-limiting oxidation in silicon and tungsten nanowires". Theoretical and Applied Mechanics Letters. 6 (5): 195–199. arXiv:1911.08908. doi:10.1016/j.taml.2016.08.002.